Ion Implantation Materials
We supply ion implantation materials used for the “impurities doping” process of semiconductor. Our ion implantation materials can be divided into two categories “Gas Source”and “Solid Source”.
Gas Source
We supply high purity ion implantation materials as Gas Source.
|
Product Name | Chemical Name |
Formula | Purity | Size |
|---|---|---|---|---|
| 3M™ 11B Enriched Boron Trifluoride | 11B Enriched Boron Trifluoride | 11BF３ | 99.99% | *** |
| Germanium Tetrafluoride | Germanium Tetrafluoride | GeF4 | 99.99% | *** |
Solid Source
We supply high purity ion implantation materials as Solid Source.
|
Product Name | Chemical Name |
Formula | Purity | Size |
|---|---|---|---|---|
| Red Phosphorus | Red Phosphorus | P | 99.9999% | Chunk, Ingot |
| Arsenic | Arsenic | As | 99.9999% | Chunk |
| Antimony Trioxide | Antimony Trioxide | Sb2O3 | 99.999% |
Granular, Powder |
| Indium Trichloride | Indium Trichloride | InCl3 | 99.999% | Granular |
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