HOME > English HOME > Products > CVD/Diffusion Materials

CVD/Diffusion Materials

CVD Materials

The CVD materials are indispensable for thin film growth in the semiconductor manufacturing process. In addition to the materials and specifications introduced here, we supply a wide variety of materials with different specifications according to customers` needs.

Tetraethyl Orthosilicate (TEOS) Containers for CVD Materials

Product Name

Chemical Name

Formula 

Purity
TEOS Tetraethyl Orthosilicate Si(C2H5O)4 99.99999%〜99.999999%

TEB

Triethyl Borate B(C2H5O)3 99.99999%
TEPO Triethyl Phosphate PO(C2H5O)3 99.99999%
TMB Trimethyl Borate B(CH3O3) 99.99999%
TMPO Trimethyl Phosphate PO(CH3O)3 99.99999%
TMPI Trimethyl Phosphite P(CH3O)3 99.99999%
POCl3 Phosphorus Oxychloride POCl3 99.9999%
BBr3 Boron Tribromide BBr3 99.9999%
TiCl4 Titanium Tetrachloride TiCl4 99.9999%
YAMANAKA CERADINE,INC
81-77-536-2022
Contact Us
このページの先頭へ戻る