| A |
Al |
アルミニウム |
Aluminum |
5N~7N, 99.999〜99.99999% |
| B |
B |
高純度ボロン |
UHP Boron |
6N, 99.9999% |
| 11BF３ |
3M™ 11B濃縮三フッ化硼素 |
3M™ 11B Enriched Boron Trifluoride |
4N, 99.99% |
| TEB |
硼酸トリエチル |
Triethyl Borate |
7N, 99.99999% |
| TMB |
硼酸トリメチル |
Trimethyl Borate |
7N, 99.99999% |
| BBr3 |
三臭化硼素 |
Boron Tribromide |
6N, 99.9999% |
| Bi |
ビスマス |
Bismuth |
5N~6N, 99.999〜99.9999% |
| B |
低炭素ボロン |
Low Carbon Boron |
C<100ppm |
| B4C |
B4C(炭化硼素)焼結体 |
Sintered B4C Parts |
2N~3N, 99%~99.9%(Starting material) |
| 11B4C |
B4C(炭化硼素)焼結体 |
Sintered B4C Parts |
2N~3N, 99%~99.9%(Starting material) |
| 10B4C |
B4C(炭化硼素)焼結体 |
Sintered B4C Parts |
2N~3N, 99%~99.9%(Starting material) |
| 11B H3BO3 |
3M™ 11B 濃縮硼酸 |
3M™ 11B Enriched |
11B >98% |
| 10B H3BO3 |
3M™ 10B 濃縮硼酸 |
3M™ 10B Enriched |
10B >96% |
| 10B |
3M™ 10B 濃縮硼素 |
3M™ 10B Enriched |
10B >96% |
| 11B4C |
3M™ 11B 濃縮炭化硼素 |
3M™ 11B Enriched |
11B >98% |
| K10BF4 |
3M™ 10B 濃縮硼フッ化カリウム |
3M™ 10B Enriched Potassium Fluoroborate |
10B >96% |
| [(CH3)2N]2BBr |
ブロモビス(ジメチルアミノ)ボラン |
Bromobis(dimethylamino)borane |
>97% |
| B[N(CH3)2]3 |
トリス(ジメチルアミノ)ボラン |
Tris(dimethylamino)borane |
>97% |
| [(CH3)2N]2BCl |
クロロビス(ジメチルアミノ)ボラン |
Chlorobis(dimethylamino)borane |
>97% |
| NH3BH3 |
ボラン-アンモニア錯塩 |
Ammonia borane |
>97% |
| H310BO3 |
3M™ 10B |
3M™ 10B Enriched Boric Acid (EBA) |
10B >96% |
| 10B4C |
3M™ 10B |
3M™ 10B Enriched Boron Carbide |
10B >96% |
| 10B |
3M™ 10B |
3M™ 10B Enriched Boron |
10B >96% |
| Na10B5O8 |
3M™ 10B |
3M™ 10B Enriched |
10B >96% |
| B |
B target / 焼結体 |
Boron target |
2N~6N, 99%~99.9999%(Starting material) |
| 11B |
Boron target |
Boron target |
5N~6N, 99.999%~99.9999%(Starting material) |
| 10B |
Boron target |
Boron target |
2N~3N, 99%~99.9%(Starting material) |
| 11B4C |
B4C燒結体 |
Sintered B4C Parts |
2N~3N, 99%~99.9%(Starting material) |
| 10B4C |
B4C燒結体 |
Sintered B4C Parts |
2N~3N, 99%~99.9%(Starting material) |
| C |
Cd |
カドミウム |
Cadmium |
|
| F |
Fe10B |
3M™ 10B 濃縮硼化鉄 |
3M™ 10B Enriched Iron Boride |
10B >96% |
| G |
Ga |
ガリウム |
Gallium |
4N~7N, 99.99%~99.99999% |
| GeF4 |
四弗化ゲルマニウム |
Germanium Tetrafluoride |
4N, 99.99% |
| GeCl4 |
四塩化ゲルマニウム |
Germanium Tetrachloride |
6N, 99.9999% |
| Ga2O3 |
酸化ガリウム |
Gallium Trioxide |
4N5, 99.995% |
| GaCl3 |
三塩化ガリウム |
Gallium Trichloride |
4N~5N, 99.99%~99.999% |
| I |
InCl3 |
三塩化インジウム |
Indium Trichloride |
5N, 99.999% |
| In |
インジウム |
Indium |
4N5~6N5, 99.995%~99.99995% |
| HI |
ヨウ化水素酸 |
Hydriodic Acid |
7N, 99.99999% |
| L |
7LiOH・H2O |
3M™ 7Li 濃縮 |
3M™ 7Li Enriched |
7Li >99% |
| 7LiOH・H2O |
水酸化リチウム-7 |
10% minimum solution of |
7Li >99% |
| M |
Mn |
マンガン |
Manganese |
5N, 99.999% |
| N |
Ni |
ニッケル |
Nickel |
4N, 99.99% |
| Nano powder |
Nano powder |
Nano powder |
2N~3N, 99%~99.9%(metal basis, starting material) |
| P |
P |
赤燐 |
Red Phosphorus |
6N, 99.9999% |
| TEPO |
燐酸トリエチル |
Triethyl Phosphate |
7N, 99.99999% |
| TMPO |
燐酸トリメチル |
Trimethyl Phosphate |
7N, 99.99999% |
| TMPI |
亜燐酸トリメチル |
Trimethyl Phosphite |
7N, 99.99999% |
| POCl3 |
オキシ塩化燐 |
Phosphorus Oxychloride |
6N~7N, 99.9999%~99.99999% |
| H3PO4 |
高純度燐酸 |
UHP Phosphoric Acid |
6N, 99.9999% |
| PCl3 |
三塩化燐 |
Phosphorus Trichloride |
6N, 99.9999% |
| S |
Sb |
アンチモン |
Antimony |
6N, 99.9999% |
| Sb2O3 |
三酸化アンチモン |
Antimony Trioxide |
5N, 99.999% |
| SbF3 |
三フッ化アンチモン |
Antimony Trifluoride |
4N, 99.99% |
| TEOS |
珪酸エチル |
Tetraethyl Orthosilicate |
7N~8N, 99.99999%~99.999999% |
| CH3SiCl3 |
メチルトリクロロシラン |
Methyltrichlorosilane |
6N, 99.9999% |
| SiCl4 |
四塩化珪素 |
Silicon Tetrachloride |
6N, 99.9999% |
| SOCl2 |
塩化チオニル |
Thionyl Dichloride |
6N, 99.9999% |
| T |
TiCl4 |
四塩化チタン |
Titanium Tetrachloride |
6N, 99.9999% |
| Te |
テルル |
Tellurium |
5N~6N, 99.999%~99.9999% |
| Y |
C33H57O6Yb |
Yb(TMHD)3 |
TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)YTTERBIUM |
High Purity |
| Z |
Zr10B2 |
3M™ 10B 濃縮硼化ジルコニウム |
3M™ 10B Enriched |
10B >96% |
